Damage Reduction using Alternative Scanning Methods in Electron Microscopy

The main limitation to perform localized analysis in electron microscopy is radiation damage.

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Organic and biological materials are very sensitive to the energetic electrons. Radiation damage and its secondary effects such as the loss of mass occur at different time scales. The dynamic of these processes can be used to reduce sample degradation by pulsed beam illumination and alternative scanning methods. We explore these methods at different time scales and acquisition schemes, and study the damage behaviour by a diffusion model. These approaches can be coupled to electron ptychography and EDX or EELS techniques, or applied to focus ion beam.